JPS6211068B2 - - Google Patents

Info

Publication number
JPS6211068B2
JPS6211068B2 JP8617080A JP8617080A JPS6211068B2 JP S6211068 B2 JPS6211068 B2 JP S6211068B2 JP 8617080 A JP8617080 A JP 8617080A JP 8617080 A JP8617080 A JP 8617080A JP S6211068 B2 JPS6211068 B2 JP S6211068B2
Authority
JP
Japan
Prior art keywords
etching
pattern
etched
patterns
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8617080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5713180A (en
Inventor
Kenji Myashita
Motoki Okazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8617080A priority Critical patent/JPS5713180A/ja
Publication of JPS5713180A publication Critical patent/JPS5713180A/ja
Publication of JPS6211068B2 publication Critical patent/JPS6211068B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
JP8617080A 1980-06-25 1980-06-25 Etching method Granted JPS5713180A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8617080A JPS5713180A (en) 1980-06-25 1980-06-25 Etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8617080A JPS5713180A (en) 1980-06-25 1980-06-25 Etching method

Publications (2)

Publication Number Publication Date
JPS5713180A JPS5713180A (en) 1982-01-23
JPS6211068B2 true JPS6211068B2 (en]) 1987-03-10

Family

ID=13879276

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8617080A Granted JPS5713180A (en) 1980-06-25 1980-06-25 Etching method

Country Status (1)

Country Link
JP (1) JPS5713180A (en])

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5941839A (ja) * 1982-08-31 1984-03-08 Fujitsu Ltd パタ−ン形成方法
JPS5950527A (ja) * 1982-09-16 1984-03-23 Hitachi Ltd 半導体装置
JPS60148118A (ja) * 1984-01-13 1985-08-05 Toshiba Corp 半導体装置
JPH0658947B2 (ja) * 1984-02-24 1994-08-03 株式会社日立製作所 半導体メモリ装置の製法
JPS62503204A (ja) * 1985-06-28 1987-12-17 アメリカン テレフオン アンド テレグラフ カムパニ− ドライエッチングを含むデバイスの製作プロセス
JPS6289331A (ja) * 1985-10-16 1987-04-23 Toshiba Corp 微細パタ−ンの加工方法
JPS62123722A (ja) * 1985-11-22 1987-06-05 Nec Corp 半導体装置
JPH07101683B2 (ja) * 1986-07-29 1995-11-01 株式会社東芝 半導体装置のパタ−ン形成方法
JPS63138738A (ja) * 1986-12-01 1988-06-10 Ricoh Co Ltd 半導体装置の製造方法
JPH04142739A (ja) * 1990-10-03 1992-05-15 Nec Corp 半導体集積回路装置

Also Published As

Publication number Publication date
JPS5713180A (en) 1982-01-23

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